METHOD AND APPARATUS FOR THE DEPOSITION OF PARYLENE AF4 ONTO SEMICONDUCTOR WAFERS

摘要

Chemical vapor deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. A method of depositing parylene AF4 onto the surface of a semiconductor wafer includes cooling the semiconductor chip wafer and depositing parylene monomers onto a surface of the wafer. The method may further include heating the wafer and/or heating the wafer to a predetermined annealing temperature, and subsequently re-cooling the wafer. 00000