| 摘要 |
A lithographic projection apparatus for step-and-scan imaging of a mask pattern (c) on a substrate (W) is described. The synchronous movement of the mask (MA) and the substrate (W) during scanning is controlled by means of contactless measuring systems, inter alia, interferometer systems (ISR, ISW), while the measuring faces (R1,r, R1,w) associated with these systems are formed by faces of the holders (WH, MH) for the substrate (W) and the mask (MA), so that very accurate measurements are possible.
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