摘要 |
<p>A method of uniformly polishing a hard disc wile suppressing static electricity caused by friction between the hard disc and an abrasive and enabling preventing deformation of the hard disc due to frictional heat. A turntable is rotatably provided which places thereon a hard disc. An abrasive is provided which rotates substantially horizontally to abut against the hard disc to polish the same. The turntable is provided to be horizontally movable relative to a rotating surface of the abrasive. A rotating shaft of the abrasive is slightly inclined relative to a direction vertical to the disc surface toward the center of the turntable. Frictional forces, which cause the abrasive to abut against the hard disc, rotate the turntable in a direction opposite to a direction of rotation of the abrasive. The hard disc is polished while being substantially grounded.</p> |