| 摘要 |
PURPOSE:To obtain a negative photosensitive composition having high sensitivity, with the strength of a film at its picture part increased and excellent in wear resistance by incorporating specified photo-crosslinkable high molecular compd. and surface-reformed silica particle. CONSTITUTION:A photo-crosslinkable high molecular compd. having a photo- crosslinkable group shown by formula I and a surface-reformed silica fine particle with at least one kind of functional group shown by formula II bonded chemically to its surface are incorporated. In formula I, T<1> and T<2> are hydrogen atom, halogen atom, alkyl or aryl, and a ring can be formed by T<1> and T<2>. In formula II, R is a bivaelent connecting group consisting of >=2 kinds selected from C, H, N, O, S and Si, and Y is at least a group shown by formula III. In formula III, Q<1> and Q<2> are halogen atom, alkyl or aryl. Consequently, a high-sensitivity composition capable of obtaining a sufficient picture even with a short exposure time, with the film strength at the picture part increased and excellent in wear resistance is obtained. |
