| 摘要 |
PURPOSE:To obtain the photosensitive composition for forming a planographic printing plate superior in developability to an aqueous alkaline developing solution and good in photocross-linking performance and high in printing resistance of the obtained printing plate. CONSTITUTION:The photosensitive resin composition for forming the planographic printing plate comprises a diazo resin synthesized through the courses of (1)-(3), a polyurethane resin substituted by acidic hydrogen atoms and a modified polyvinyl acetal. In (1), an oligomer is synthesized by ring- opening polymerization reaction of a compound having 2 oxirane rings in one molecule with a compound represented by formula in which each of R<1> and R<2> is H, alkyl alkoxy, or halogen; W is a single bond or a divalent organic group; and Y is a group convertible into an amino group. In (2), the substituent Y of the oligomer is converted into the amino group. In (3), this amino group is converted into a diazonium salt. |
