Apparatus for coating a substrate surface

摘要

In a vacuum vapour deposition apparatus and process for coating a substrate (10) with inorganic material (24) evaporated from a crucible (22) by an electron beam or laser gun (26), the electron or laser beam (27) is directed at an angle ( alpha ) of 10-80 (preferably 20-70, especially 30-60) degrees to the inorganic material surface to form an overhang (29) for line-of-sight screening between the evaporating material and the substrate surface (18). Preferably, the evaporation crucible (22) can be moved relative to the beam (27) and the beam (27) can be oscillated from side to side relative to the longitudinal direction of the crucible (22).