TARGET FOR CATHODE SPUTTERING,申请号EP19920904520-传众专利搜索

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发明名称	TARGET FOR CATHODE SPUTTERING
摘要
申请公布号	EP0569467(B1)	申请公布日期	1997.09.10
申请号	EP19920904520	申请日期	1991.11.18
申请人	MATERIALS RESEARCH CORPORATION	发明人	MARX, DANIEL R.;HURWITT, STEVEN D.
分类号	C23C14/34;H01J37/34;(IPC1-7):C23C14/34	主分类号	C23C14/34
代理机构		代理人
主权项
地址

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