| 摘要 |
PROBLEM TO BE SOLVED: To reduce attachment or deposition of an inconvenient scatter grain in an X-ray discharge direction for stably using a device for a long time in the case of using buffer gas for prohibiting the scatter grain. SOLUTION: An excitation energy beam is applied to a target member 214 in a pressure-reduced vacuum container 221 to form plasma 213, where buffer gas is used for prohibiting a scatter grain discharged from the target member 214 and/or the plasma 213. In this case, a member having an aperture part A for an excitation energy beam 211 to pass and a separate aperture part B for an X-ray 212 to pass is provided close to the target member 214 and the plasma 213 as a scatter grain shielding member 201 to shield the scatter grain discharged from the target member 214 and/or the plasma 213. In addition, a scatter grain prohibiting member 202 is provided adjacent to or close to a three-dimensional angular range equivalent to a range where the X-ray 212 is taken out. |
