| 摘要 |
PROBLEM TO BE SOLVED: To facilitate the alignment even in use of a colored photo resist by using a light source having a wide wavelength range for an alignment system and providing a bandpass optical filter at a light path of the alignment light from the light source. SOLUTION: An exposure apparatus 1 selects a bandpass optical filter suited to the light transmission characteristic of a color resist coated on a semiconductor wafer 21, and aligns with an alignment light having a narrow wavelength width at exposure of the wafer. The ratio of a light reflected from an alignment mark among reflected lights incident on a photo detector 36 and a light reflected from other part is high and the wavelength width of the alignment light is narrow, resulting in a little blooming due to the chromatic aberration. As a result, the image information of the alignment mark at the photo detector 36 can be detected at high accuracy to enable a high accuracy alignment. |
