ACETAL GROUP-CONTAINING ALKOXY-STYRENE POLYMER, ITS PRODUCTION AND CHEMICAL AMPLIFICATION TYPE PHOTORESIST MATERIAL COMPRISING ALKOXY-STYRENE POLYMER AS MAIN COMPONENT

摘要

There are provided acetal group-containing alkoxy-styrene polymers represented by the following formula I: <IMAGE> [I] wherein R1 and R3 may be the same or different, and represent a hydrogen atom or a methylene group; R2 represents <IMAGE> 8 may be the same or different, and independently represent a hydrogen atom, an alkyl group or an aryl group; m+n=1; k is an integer of 1-5; and l is an integer of 0-5; and an acid-generating agent, and chemical amplified negative photoresist composition comprising the same. It shows excellent transparency and sensitivity to deep UV in addition to being resistant to dry etching and alkali-developable.