| 摘要 |
<p>PROBLEM TO BE SOLVED: To reduce the wear of a holding face and deposit of foreign matter such as dust and wearing powder due to slide with an article by covering the holding face with an amorphous hard C film contg. Si and at least one of Zr, W and Ti. SOLUTION: A vacuum chuck 10 has high-purity alumina ceramics-made disc-like plate 11 having ring-like protrudent wall parts concentrically formed on one surface to form a rough surface and the surface of the wall parts 16 is a holding face 12. An amorphous hard C film 15 contg. Si and Zr is overlaid on the surface of the plate 11, including the holding face 12. A semiconductor wafer put on the holding face 12 is vacuum-sucked through suction holes 13 to accurately suck and hold it. Thus, it little wears if repeating the mounting and removing semiconductor wafers and hence it is possible to reduce the deposition of foreign matters such as dust and wearing powder to the wafer.</p> |
