| 摘要 |
PROBLEM TO BE SOLVED: To form a resist pattern excellent in adhesion to a substrate in the production of a semiconductor device, LCD, etc., without deteriorating the shelf stability of a resist by adding specified imidazole to a compsn. consisting of alkali-soluble novolak resin and a compd. having a quinonediazido group. SOLUTION: A compd. (imidazole) represented by the formula is added as an adhesion improver to a basic compsn. consisting of alkali-soluble novolak resin and a compd. having a quinonediazido group by 0.05-20 pts.wt., preferably 0.5-10 pts.wt. per l00 pts.wt. of the basic compsn. In the formula, R1 is vinyl, benzyl, etc., and R2 is 1-5C alkyl or H. |
