| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive material excellent in image reproducibility and moreover, having excellent scratching resistance. SOLUTION: This photosensitive material has at least one layer containing a redox DIR compd. which releases a development inhibitor by oxidation and a dye layer having dispersion of a particulate solid on a base body. The layer containing a redox DIR compd., the solid dispersion dye layer, and a silver halide emulsion layer and an emulsion protective layer are formed by coating in this order on the base body. The photosensitive material also contains a hydrazine deriv. as a high contrast agent. The whole wet film thickness of coating liquids is between <=60μm and <=100μm in the coating process for from the lowest layer to the uppermost layer, and the wet film thickness of the lowermost layer is between >=5μm and <=20μm during coating.
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