发明名称 |
EXPOSURE DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device rich in flexibility and capable of easily coping with the increase of the scale of a photoreceptive substrate and substrate sizes different for each manufacturing line. SOLUTION: Plural rows of projection optical system units 4 having the same symmetrical rectangular parallelepiped structure and constituted so as to be fixed to each other in the same posture are arranged zigzag on base hardware 5. Illuminating units 61 arrayed to be compatible with the axes the projection optical system units 4 and having the same unit structure as that of the units 4 are provided. It is constituted so that the exposure regions of the adjacent optical system units 4 are overlapped with each other in exposure scanning. Each of projection optical system unit 4 is provided with an image forming position changing means for adjusting the position of an image in an image forming surface to correct the assembling errors of the units 4 and the dispersion of each unit. |
申请公布号 |
JPH09230412(A) |
申请公布日期 |
1997.09.05 |
申请号 |
JP19960040900 |
申请日期 |
1996.02.28 |
申请人 |
NIKON CORP |
发明人 |
SEKI MASAMI;CHIBA HIROSHI |
分类号 |
G03B7/20;G02F1/13;G02F1/1333;G03F7/20;H01L21/027;(IPC1-7):G03B7/20;G02F1/133 |
主分类号 |
G03B7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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