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发明名称
APERTURE MASK FOR CHARGED PARTICLE BEAM ALIGNER AND MANUFACTURE THEREOF
摘要
申请公布号
JPH09232209(A)
申请公布日期
1997.09.05
申请号
JP19960036036
申请日期
1996.02.23
申请人
NEC CORP
发明人
AIZAKI HISAAKI
分类号
G03F7/20;H01L21/027;(IPC1-7):H01L21/027
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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