| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a rotary substrate treatment device short in the treatment time while having a simple device structure. SOLUTION: When a ring-like magnet 23 ascends, a repulsive force of a magnetic force affecting a permanent magnet 8 integral in a push-up member 10 is increased, and when the repulsive force is presently greater than gravity acting on the push-up member 10, the push-up member 10 starts rotating with a support shaft 7a serving as a rotation shaft and a plate 6 also starts ascending together therewith. When the ring-like magnet 23 further ascends, the push-up member 10 rotates until a position where its vertical member 10b comes into contact with a pin 9a, and the plate 6 ascends to the vicinity of a substrate W. At this time, an ascending position of the plate 6 is restricted by using a bolt 11 so that the plate 6 does not come into contact with a pattern face Wa of the substrate W. If the ring-like magnet 23 is at a position for ascending, as the ring-like magnet 23 is annular, the repulsive force always affects the permanent magnet 8 during a rotation processing and it is possible to maintain stably the plate 6 at an ascending position.</p> |
