| 摘要 |
<p>PROBLEM TO BE SOLVED: To clean a rotation pedestal and a treatment liquid recovery cup. SOLUTION: After a substrate is completed applying, the substrate which has finished treatment is removed from a substrate support member 5 provided in a rotation pedestal 1, and cleaning is started for the rotation pedestal 1 and a cup 20. The cleaning is performed while rotating the rotation pedestal 1 and spraying a lotion from a cleaning nozzle 10. When the cleaning nozzle 10 is located between a line L1 and a line L2, the lotion is adhered to a margin part la to clean the magin part 1a. Further, when the cleaning nozzle 10 is located between a line L2 and a line L3, the lotion is adhered to an inside 1b of the rotation pedestal 1 and sprayed to an inner wall of the cup 20 from a spary hole 3c through a tapered part 3a and an induction part 3b of a guide part 3, so that the cup 20 is cleaned.</p> |
