| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photoresist compsn. having high sensitivity while retaining a high resolving power and high heat resistance, also having satisfactory shelf stability and generating no dust at the time of heat treatment by incorporating an alkali-soluble resin made of a polycondensation product of specified phenol and carbonyl compds. including a specified arom. aldehyde and contd. a specified amt. of a cyclic oligomer. SOLUTION: This alkali-soluble resin is made of a polycondensation product of phenol represented by formula I and carbonyl compds. including arom. aldehyde represented by formula II and has <=2wt.% cyclic oligomer content. In the formula I, R1 is a 1-4C alkyl, 1-4C alkoxy or hydroxy, (m) is an integer of 0-3, and in the case of m=2 or 3, plural R1 's may be different from each other. In the formula II, R2 is a 1-4C alkyl, 1-4C alkoxy and (n) is an integer of 0-5. |
