| 摘要 |
<p>A method for forming a Ti1-xAlxN coating on a part, wherein a chemical vapour deposition chamber is heated to 250-500 °C; the part to be coated is heated to 550-650 °C and placed in said chamber; and a mixture of titanium and aluminium chlorides, NH3 and H2 is injected into the chamber. The molar amount of NH3 is greater than the molar amount of chlorides, and the molar amount of hydrogen is over five times greater than the molar amount of chlorides.</p> |
