发明名称 |
Ceramic electrostatic chuck with built-in heater |
摘要 |
Proposed is a ceramic-based electrostatic chuck with built-in heater used in high-temperature processing of a semiconductor silicon wafer, which is capable of exhibiting excellent electrostatic attracting force even at a temperature at which conventional ceramic-based electrostatic chucks cannot exhibit high attracting force. The electrostatic chuck with built-in heater of the invention is an integral body comprising: (a) a base body of a sintered mixture of boron nitride and aluminum nitride; (b) a first pyrolytic graphite layer formed on one surface of the base body to serve as a resistance heater element; (c) a first insulating layer of pyrolytic boron nitride on the first pyrolytic graphite layer; (d) a second pyrolytic graphite layer formed on the other surface of the base body to serve as the electrodes for electrostatic chucking; and (e) a second insulating layer on the second pyrolytic graphite layer formed from a pyrolytic composite nitride of boron and silicon of which the content of silicon is in the range from 1% to 10% by weight having an appropriate volume resistivity at a temperature of 500 DEG to 650 DEG C. as deposited by the pyrolysis of a gaseous mixture of ammonia, boron trichloride and silicon tetrachloride.
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申请公布号 |
US5663865(A) |
申请公布日期 |
1997.09.02 |
申请号 |
US19960603155 |
申请日期 |
1996.02.20 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
KAWADA, NOBUO;NAKAJIMA, RYOJI;SHINDO, TOSHIHIKO;NAGAO, TAKAAKI |
分类号 |
B25J15/06;C04B35/583;C04B41/87;H01L21/00;H01L21/683;H02N13/00;(IPC1-7):H02N13/00 |
主分类号 |
B25J15/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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