Method of separately determining plug resistor and interfacial resistor and test pattern for the same

摘要

The present invention provides a test pattern and method for separately measuring a plug resistance and interfacial resistance of a contact resistance with high precision including the steps of: (a) providing on a semiconductor chip a test pattern as described above; (b) applying a predetermined voltage between the electrode pad patterns of one of a pair of first and second electrode pad patterns and a pair of third and fourth electrode pad patterns and measuring a current flowing between the electrode pad patterns of the one pair in an open state between the electrode pad patterns of the other pair; (c) repeating this measuring method between the electrode pad patterns of each pair; and (d) determining a first plug resistance of the first or fourth contact hole and a second plug resistance of the second or third contact hole from the voltage and the first to third currents.