| 摘要 |
PROBLEM TO BE SOLVED: To prevent dropping off of diamond abrasive particles to thereby prevent damage on the surface of wafer in dressing a polishing mat in a dresser in which a diamond abrasive particle layer surface is pependicular to a rotation shaft by arranging the most protruding part of each diamond abrasive particle in the same plane with a specified flatness. SOLUTION: A diamond abrasive particle layer 1 to be connected to a base 5 through a connection layer 4 is composed of a fixed layer 3 in which diamond abrasive particles 2 are embeded, and a most protruding part 6 of each abrasive particle 2 is arranged in the same plane. The flatness of the plane in which the part 6 exists should be 30μm or below, desirably 5μm or bellow, thereby providing an excellent flatness at the application to the dressing of a polishing mat. Such a layer 1 is formed by temporalily fixing one layer of abrasive particle onto the diamond abrasive particle fixed surface of inverted type by electrodeposition. and thereafter by fixing it with metal or resin in a burried manner. |
