发明名称 Semiconductor device having diffraction grating
摘要 A semiconductor device has a substrate composed of a semiconductor which has one of sphalerite and diamond crystal structures. The substrate has a plane orientation inclined at 0.5 DEG to 15 DEG with respect to one of {111} and {110} planes indicated by Miller indices. A first semiconductor layer is formed on the substrate. The first semiconductor layer has a sawtooth-shaped first periodic structure consisting of one of the {111} and {110} planes indicated by the Miller indices and at least one plane indicated by another index. A second semiconductor layer is formed on the first semiconductor layer. The second semiconductor layer has a second periodic structure having a phase shifted from a phase of the first periodic structure.
申请公布号 US5663592(A) 申请公布日期 1997.09.02
申请号 US19950504487 申请日期 1995.07.20
申请人 CANON KABUSHIKI KAISHA 发明人 MIYAZAWA, SEIICHI;OHTSUKA, MITSURU;MIZUTANI, NATSUHIKO
分类号 H01L29/12;H01L29/775;H01L33/16;H01S5/02;H01S5/10;H01S5/12;H01S5/183;H01S5/187;H01S5/30;H01S5/32;H01S5/34;(IPC1-7):H01L29/04;H01S3/19 主分类号 H01L29/12
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