发明名称 Defect inspection method and apparatus, and defect display method
摘要 In a defect inspection method, inspection light is irradiated onto the surface to be inspected of an object to be inspected, a defect on the surface to be inspected is detected on the basis of a signal obtained by photoelectrically converting scattered light of the inspection light from the surface to be inspected, and the size of the detected defect is determined. When a plurality of defects are detected, the detected defects are observed at a predetermined magnification in the order from larger defects on the basis of the determination result. When a defective portion is found as a result of the observation, defect inspection of the object to be inspected is terminated.
申请公布号 US5663569(A) 申请公布日期 1997.09.02
申请号 US19940318551 申请日期 1994.10.05
申请人 NIKON CORPORATION 发明人 HAYANO, FUMINORI
分类号 G01N21/94;(IPC1-7):G01N21/86 主分类号 G01N21/94
代理机构 代理人
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