发明名称 ELECTRODE PLATE FOR PLASMA ETCHING
摘要 PROBLEM TO BE SOLVED: To provide an electrode plate for plasma etching reduced in consump tion by etching, excellent in produce yield and consisting of a vitreous carbon material. SOLUTION: This electrode plate consists of a vitreous carbon material wherein the ratio R of the intensity IA of the spectrum appearing in 1060&plusmn;100cm<-1> band to the intensity IB of the spectrum appearing in 1580&plusmn;100cm<-1> band and the average lattice spacing d002 (in &angst;) of the graphite hexagonal reticular face layer suffice the formula R>=(d002 -3.344)/0.135 in the Raman spectrum analysis using an argon ion laser beam of 5145&angst;wavelength.
申请公布号 JPH09221310(A) 申请公布日期 1997.08.26
申请号 JP19960052464 申请日期 1996.02.15
申请人 TOKAI CARBON CO LTD 发明人 NOBATA MITSUHARU
分类号 C01B31/02;C04B35/52;C23F4/00;H01L21/302;H01L21/3065 主分类号 C01B31/02
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