发明名称 WATER-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION
摘要 <p>PROBLEM TO BE SOLVED: To obtain a resin compsn. excellent in water developability, less liable to swell at the time of water development, causing a slight reduction of strength and a slight dimensional change at the time of water development and giving a resin plate excellent in strength, breaking extension and impact resilience after photosetting. SOLUTION: This resin compsn. contains a particle-shaped copolymer obtd. by emulsion- or suspension-polymerizing a monomer mixture contg. an aliphatic conjugated diene monomer, a mono-unsatd. monomer having a carboxyl, amino, hydroxyl or epoxy group and a poly-unsatd. monomer as essential components, a block copolymer consisting of two or more polymer segments and having an O-contg. repeating units in the principal chain of at least one of the segments, a photopolymerizable unsatd. monomer and a photopolymn. initiator.</p>
申请公布号 JPH09222730(A) 申请公布日期 1997.08.26
申请号 JP19960052643 申请日期 1996.02.16
申请人 JAPAN SYNTHETIC RUBBER CO LTD 发明人 KOSHIMURA KATSUO;KONNO TOMOHISA;YASUDA KENJI
分类号 G03F7/027;C08F2/44;C08F2/48;C08F36/00;C08F236/04;C08F293/00;C08F297/00;C08G81/02;C09D11/00;C09D109/00;C09D157/00;G03F7/00;G03F7/028;G03F7/033;G03F7/20;H01L21/027;(IPC1-7):G03F7/033 主分类号 G03F7/027
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