| 摘要 |
PROBLEM TO BE SOLVED: To obtain a compsn. giving a satisfactory antireflection film having low dry etching resistance by incorporating two or more kinds of specified compds. including a coating film forming material. SOLUTION: This compsn. contains two or more kinds of compds. including a coating film forming material. The difference in solubility to a solvent between the compds. in a coating film is increased by heating and/or irradiation with light after coating. The increased difference is >=5 times, preferably >=10 times so as to dissolve and remove only the desired one of the compds. and to leave the desired coating film forming material. The coating film forming material is, e.g. a combination of a compd. whose solubility to water is reduced by heating, e.g. PVA with a compd. whose solubility to water is not varied by heating, e.g. polyacrylic acid. |
