发明名称 Silicon carbide MOSFET
摘要 A silicon carbide MOSFET (10) is formed to have a high breakdown voltage. A breakdown enhancement layer (20) is formed between a channel region (14) and a drift layer (12). The breakdown enhancement layer (20) has a lower doping concentration that increases the width of a depletion region (24) near a gate insulator (17). The increased depletion region width improves the breakdown voltage.
申请公布号 US5661312(A) 申请公布日期 1997.08.26
申请号 US19950413319 申请日期 1995.03.30
申请人 MOTOROLA 发明人 WEITZEL, CHARLES E.;BHATNAGAR, MOHIT
分类号 H01L29/12;H01L29/24;H01L29/78;(IPC1-7):H01L31/031 主分类号 H01L29/12
代理机构 代理人
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