发明名称 Transistor structure and method for fabricating the same
摘要 A transistor including an insulating film, a gate, and a source/drain all formed on a semiconductor substrate, wherein the gate overlaps at an edge thereof with the source/drain disposed below the gate, whereby the transistor has a structure capable of avoiding a direct contact between the metal wiring and the source/drain. The gate is formed after a formation of the source/drain.
申请公布号 US5661327(A) 申请公布日期 1997.08.26
申请号 US19960665048 申请日期 1996.06.12
申请人 HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. 发明人 PARK, SANG HOON
分类号 H01L23/522;H01L21/265;H01L21/336;H01L21/768;H01L29/08;H01L29/417;H01L29/78;(IPC1-7):H01L29/76;H01L29/94;H01L31/062;H01L31/113 主分类号 H01L23/522
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