| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain filter patterns with simple stages by applying a release agent in peeling first and second resist layers together with a third pigment layer thereon. SOLUTION: A soln. contg. first pigment particles is applied on a substrate 1 and is dried. A photoresist liquid is applied thereon and is dried to form a first laminated structure consisting of a first resist layer 4 and a first pigment layer 3. This laminated structure is cured by exposing and is developed to form first laminated patterns. A soln. contg. second pigment particles is applied on the substrate 1 and is dried and the photoresist liquid is applied thereon and is dried to form a second laminated structure consisting of a second resist layer 7 and a second pigment layer 6. Second laminated patterns are then formed in the same manner. A soln. contg. third pigment particles is applied on the substrate 1 and the two laminated patterns and is dried. The release agent is then applied thereon to peel the respective resist layers 4, 7 and the third pigment layer 8 together to form the pigment layers 3, 6, 8. In such a case, the first and second pigment particles are blue and red and the third pigment particles are green.</p> |
