CLEANING DEVICE FOR SEMICONDUCTOR WAFER

摘要

PROBLEM TO BE SOLVED: To provide a cleaning device preventing contamination of a wafer surface by a contaminant hitting a wall inside a bowl and being reacted so as to allow stable cleaning in an edge cleaning process of a wafer. SOLUTION: A vacuum chuck 50 adsorbing and rotating a wafer 100 of a semiconductor wafer 100, a cleaning brush 20 for cleaning an edge of the wafer 100, a conveying device 40 for horizontally conveying this cleaning brush 20 are provided in the inside of a bowl 10. The cleaning brush 20 in conveyed by the conveying device 40 to an edge part of a wafer 100 for coming in contact therewith so as to remove a photoresist substance applied on the edge of the wafer 100.