| 摘要 |
PURPOSE:To change the refractive index of silica glass over a wide range by irradiating the silica glass with light of a specific wavelength, such as vacuum UV light. CONSTITUTION:The silica glass is irradiated with the light of 193 to 0.001nm wavelength to form the refractive index distribution of the silica glass. The change rate of the refractive index is proportional to the square root of the irradiation quantity as a result of the measurement made by using the synthesized silica glass formed by a gaseous phase method as the silica glass, using the vacuum UV light generated from an undulator as the light source and measuring the change rate of the refractive index by using a Pulfrich type refractive index measuring instrument. The refractive index is changed simply by irradiating the silica glass with the vacuum UV light like this and, therefore, this method is utilizable for optical ICs, optical waveguides, optical materials, plane lenses and high dispersion lenses. The formation of a large-area plane lens is possible as well by imparting the refractive index distribution to the plane of the silica glass. |
