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经营范围
发明名称
MISSTYPE SEMICONDUCTOR DEVICE
摘要
PURPOSE:To prevent the breakage of the gate insulation film as well as to increase the voltage resistance by providing thick buried selective insulation films between the source layer, drain layer and the channel section respectively.
申请公布号
JPS52131483(A)
申请公布日期
1977.11.04
申请号
JP19760047698
申请日期
1976.04.28
申请人
HITACHI LTD
发明人
MEGURO REI
分类号
H01L21/32;H01L21/336;H01L21/76;H01L27/092;H01L29/06;H01L29/78
主分类号
H01L21/32
代理机构
代理人
主权项
地址
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