发明名称 |
DEVICE FOR CARRYING THIN PLATE-LIKE SUBSTRATE |
摘要 |
<p>A device for carrying a thin plate-like substrate such as a semiconductor wafer and controlling its position by floating it with an inert gas of low impurity concentration. A transferring unit and a controlling unit are respectively provided with gas nozzles for floating a thin plate-like substrate and with a gas exhausting and circulating system, and a plurality of them are in combination with each other in a sealing state. The controlling unit, further, has a vacuum suction hole at its controlling center, and is provided with nozzles for controlling the thin plate-like substrate in its radial and cirumferential direction respectively and with nozzles for stopping the thin plate-like substrate or sending out it to the next unit too. On the bottom face of a control space, grooves extending from the vacuum suction hole are formed for improving the positional accuracy of stopping the thin plate-like substrate, and they are closed on the insides of their circumferential parts when the center of the thin plate-like substrate has coincided with the controlling center of the controlling unit. <IMAGE></p> |
申请公布号 |
EP0557523(B1) |
申请公布日期 |
1997.08.20 |
申请号 |
EP19910918908 |
申请日期 |
1991.10.28 |
申请人 |
KABUSHIKI KAISHA WATANABE SHOKO |
发明人 |
TODA, MASAYUKI;ONODA, TAKASHI;OHMI, TADAHIRO;UMEDA, MASARU;KANNO, YOICHI |
分类号 |
B65G51/03;H01L21/677;(IPC1-7):H01L21/68 |
主分类号 |
B65G51/03 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|