| 摘要 |
PURPOSE:To improve the water resistance of the title composition, and to make possible the development due to water of the composition, without injuring the dyeing properties of the composition by composing the composition of a specified polymer, a bisazide compd. and a compd. having a sulfonic acid group, as constituting elements. CONSTITUTION:The compd. having the sulfonic acid group is added to a photosensitive resin composed of a cationic polymer having a tertiary amine or a quarternary ammonium base, and a photocrosslinking agent of the bisazide compd. And the compd. having the sulfonic acid group is composed of a sulfonated compd., having 6-50 C and is exemplified by for example, an anionic type surface active agent or an anionic dye, etc. The polymer is obtd. by copolymerizing a monomer of a polymer having the structure of the tertiary amine or the quarternary ammonium salt, and an another monomer. Thus, the sufficient water resistance of the resin composition is obtd., and the development of the composition due to the water makes possible maintaining the sufficient dyeing properties of the composition. |
