| 摘要 |
<p>PROBLEM TO BE SOLVED: To prevent damages to the marks on the rear surface of a photosensitive substrate being caused by the support by a substrate holder. SOLUTION: Disposing a plurality of surface elements 48 in a portion of a wafer holder 9, the surface elements 48 are formed movably in the orthogonal direction to the surface of a wafer (W) (the orthogonal direction to the page) and independently of each other to make the wafer W supportable by the wafer holder 9 in the state that the surface elements 48 present in the opposite portions to marks M1, M2 of the wafer W are withdrawn from the surface of the wafer holder 9. Therefore, there is no possibility that the marks M1, M2 present on the rear surface of the wafer W are damaged by their contacts with the wafer holder 9 or their lateral displacements, etc., in the case of their contacts.</p> |
