| 摘要 |
A nonvolatile memory array has a plurality of diffused horizontal source lines (17), each source line (17) positioned between a pair of parallel horizontal stack conductors (ST). The plurality of the diffused horizontal source lines (17) are connected to at least one common vertical source conductor (17a). The common vertical source conductor (17a) includes continuous diffused regions (11) under each of said pair of parallel horizontal stack conductors (ST). In addition, the common vertical source conductor (17a) includes a metal conductor coupled to the continuous diffused regions at contacts (SC) located between the pairs of parallel horizontal stack conductors (ST). As a result, the stack conductors (ST) are straight. The straight-stack conductor (ST) configuration allows use of less space between a vertical source conductor (17a) and adjacent drain-column lines (18) and eliminates any need for use of vertical columns of dummy cells (10). Optional use of a straight-stack (ST) that is trimmed to a narrower width at the vertical source conductor (17a) results in a more certain conductive path under the straight stack conductors (ST).
|
