| 摘要 |
A light beam is sent onto a wafer, at different angles of incidence, thus giving rise to fluctuations in the transmittance of the wafer, as the angle of incidence varies, because of interference due to multiple reflections of the beam inside the wafer. The transmittance of the wafer is measured as the angle of incidence varies. The angular positions of transmittance maxima and minima are determined with respect to a maximum or minimum corresponding to normal incidence. The refractive index is obtained from these positions and from the number of maxima and minima in the different angles.
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