发明名称 METHOD AND DEVICE FOR CONTROLLING ENVIRONMENT OF EXPOSING DEVICE
摘要 PROBLEM TO BE SOLVED: To efficiently fill a specified gas into a substrate chamber in which the substrate is arranged. SOLUTION: This device is provided to feed the specified gas into the substrate chamber 14 in which the substrate 10 for exposing is arranged, and to exhaust a part of the gaseous mixture of air and gas inside the substrate chamber 14. Thereafter, when the gas in the substrate chamber 14 reaches a specific density, a part of the gaseous mixture of air and gas is circulate inside the substrate chamber 14, and the gas of adequate density is filled into the substrate chamber 14.
申请公布号 JPH09218519(A) 申请公布日期 1997.08.19
申请号 JP19960047942 申请日期 1996.02.09
申请人 NIKON CORP 发明人 TANIMOTO SHOICHI
分类号 G03B27/52;G03F7/20;H01L21/027;H01L21/677;(IPC1-7):G03F7/20;H01L21/68 主分类号 G03B27/52
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