| 摘要 |
<p>Continuous CVD equipment for continuously and stably forming an extremely thin organic coating having special functions such as water repellency on a continuously running film; and a continuous CVD process therefor. This equipment comprises a vacuum chamber, a vacuum pump connected to the vacuum chamber, and a heatable tank which is filled with an organic compound that can be plasma-polymerized to form a film and in which the compound is vaporized; the vacuum chamber being equipped therein with a feed roll system for feeding a film continuously and a wind-up roll system for winding up a CVD film; a special running area for conducting the CVD of the film fed from the feed roll system and a plasma-generating area adjacent to that area being provided between the feed roll system and the wind-up roll system; and the tank being connected to the inside of the vacuum chamber by a pipe to thereby enable the feeding of the vapor of the compound generated in the tank into the plasma-generating area. The CVD process is one for continuously forming an organic compound coating on a continuously running film by the use of the above equipment.</p> |
