CERIUM OXIDE ABRASIVE, SEMICONDUCTOR CHIP, SEMICONDUCTOR DEVICE, PROCESS FOR THE PRODUCTION OF THEM, AND METHOD FOR THE POLISHING OF SUBSTRATES

摘要

An abrasive comprising an aqueous slurry of the following cerium oxide particles: (1) cerium oxide particles prepared by adding hydrogen peroxide to an aqueous dispersion of cerium carbonate, (2) cerium oxide particles prepared by adding ammonium hydrogencarbonate to an aqueous solution of cerium nitrate to form a precipitate and oxidizing this precipitate with hydrogen peroxide, and/or (3) cerium oxide particles prepared by neutralizing or alkalinizing an aqueous solution of ammonium cerium nitrate.