| 摘要 |
<p>A method for determining the location of a pattern, when input in isolation, within a representative input signal is provided. The method aligns (s21) the input signal with a signal representative of a plurality of connected patterns, one of which is the same as the pattern within the input signal. The method then determines the location from the results of the aligning step. The location determined using this apparatus can be used to determine (s23) an isolated reference model by extracting features of the input signal from the location found. This isolated reference model can then be used to generate (s25 and s27) a continuous reference model for the pattern, by aligning the isolated reference model with the signals representative of a plurality of connected patterns, one of which is the pattern to be modelled. <IMAGE></p> |
