| 摘要 |
PURPOSE:To improve various characteristics, such as sensitivity, resolution, residual film rate, heat resistance, and preservable stability by incorporating the quinonediazide sulfonate of a specific compd. as a photosensitive agent into the above compsn. CONSTITUTION:The quinonediazide sulfonate of the compd. expressed by formula I is incorporated as the photosensitive agent into this compsn. In the formula I, A denotes an alkylene group, substd. alkylene group, alkenyl group, substd. alkenyl group, arylene group or substd. arylene group. R<1> to R<8> denote hydrogen, halogen, 1 to 4C alkyl group, 1 to 4C alkoxy group, 1 to 4C alkenyl group or hydroxyl group. The positive type resist compsn. which excels in the various characteristics, such as sensitivity, resolution, residual film rate, heat resistance, and preservable stability and is suitable for fine working particularly for <=1mum is obtd. in this way. |
