| 摘要 |
<p>The disclosure relates to a readily removable deposition shield assembly (1) for processing chambers (2) such as chemical vapor deposition (CVD) ion implantation, or physical vapor deposition (PVD) or sputtering chambers, is disclosed. The shield assembly includes a shield member (10) which is mounted to the chamber for easy removal, such as by screws (12), and defines a space along the periphery of the substrate support (16). A shield ring (20) is inserted into the periphery space and is thus mounted in removable fashion and is automatically centered about the substrate. The shield ring overlaps the cylindrical shield and a deposition ring (508). The deposition ring removably rests upon a flange (506) extending from the outer periphery of a substrate support pedestal. Collectively, these components prevent deposition on the chamber and hardware outside the processing region. <IMAGE> <IMAGE></p> |
