发明名称 P-type gallium nitride
摘要 Several methods have been found to make p-type gallium nitride. P-type gallium nitride has long been sought for electronic devices. N-type gallium nitride is readily available. Discovery of p-type gallium nitride and the methods for making it will enable its use in ultraviolet and blue light-emitting diodes and lasers. pGaN will further enable blue photocathode elements to be made. Molecular beam epitaxy on substrates held at the proper temperatures, assisted by a nitrogen beam of the proper energy produced several types of p-type GaN with hole concentrations of about 5x1011/cm3 and hole mobilities of about 500 cm2/V-sec, measured at 250 DEG K. P-type GaN can be formed of unintentionally-doped material or can be doped with magnesium by diffusion, ion implantation, or co-evaporation. When applicable, the nitrogen can be substituted with other group III elements such as Al.
申请公布号 US5657335(A) 申请公布日期 1997.08.12
申请号 US19930146502 申请日期 1993.11.01
申请人 THE REGENTS, UNIVERSITY OF CALIFORNIA 发明人 RUBIN, MICHAEL;NEWMAN, NATHAN;FU, TRACY;ROSS, JENNIFER;CHAN, JAMES
分类号 H01L33/00;H01L33/32;(IPC1-7):H01L33/00 主分类号 H01L33/00
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