发明名称 |
PRODUCTION OF OPTICAL ARTICLE HAVING FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide optical articles having films which have high environment resistance and are formable in an integral stage by a vapor growth method. SOLUTION: A modified layer changed in refractive index toward a thickness direction is formed on a base material by a chemical vapor growth method using at least either of a gaseous org. compd. contg. Si and an org. compd. contg. Ti and using plasma. A hard coating layer is formed on this modified layer by a chemical vapor growth method using a gaseous mixture composed of a gaseous org. compd. contg. Si and gaseous oxygen and using plasma. The surface of the hard coating layer is subjected to an activation treatment by the plasma of the gas contg. at least the gaseous oxygen. An antireflection film is formed on the hard coating layer subjected to this activation treatment. |
申请公布号 |
JPH09209154(A) |
申请公布日期 |
1997.08.12 |
申请号 |
JP19960021241 |
申请日期 |
1996.02.07 |
申请人 |
NIKON CORP |
发明人 |
SUZUKI TETSUO;NIIKURA HIROSHI;ABE ATSUSHI |
分类号 |
G02F1/1335;C03C17/34;C23C16/50;G02B1/11 |
主分类号 |
G02F1/1335 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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