| 摘要 |
PROBLEM TO BE SOLVED: To improve the wear resistance and service life of a substrate used as a tool or a member by repeatedly executing TiN film formation and ion implantation to the surface of a superhard metal substrate and forming a modified wear resistant hard layer film with certain thickness thereon. SOLUTION: A TiN film 2 is formed on a substrate 1 by a CVD method and a PVD method, and after that, ion implantation 4 under 20 to 80kv accelerated voltage is executed to form a Ti film modified layer 3. The stages of this TiN film formation and ion implantation are alternatively repeated to regulate the total thickness of the modified layer 3 to 0.05 to 10μm. As the ions at the time of the ion implantation, at least one or more kinds selected from B, Al, Si, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta and W are used and in the case the total amt. of the ions to be implanted is defined as M ion/cm<2> and the total thickness of the modified layer 3 as dμm, M/d=1×10<17> to 1×10<19> is satisfied, by which the optimum amorphous phase components can be obtd.
|
