发明名称 Semiconductor integrated circuit device having single-element type nonvolatile memory elements
摘要 A semiconductor integrated device having a non-volatile memory element or memory cell of a single-element type in a non-volatile memory circuit employing a field effect transistor which has, in addition to a floating gate electrode for storage of information and a controlling gate electrode, a source which includes a heavily doped region having a depth into the semiconductor substrate extending from the major surface thereof which is large. The single-element type field effect transistor, furthermore, has a drain which includes a lightly doped region which has a depth extending into the semiconductor substrate from the major surface thereof which is small.
申请公布号 US5656839(A) 申请公布日期 1997.08.12
申请号 US19950422941 申请日期 1995.04.17
申请人 HITACHI, LTD. 发明人 KOMORI, KAZUHIRO;NISHIMOTO, TOSHIAKI;MEGURO, SATOSHI;KUME, HITOSHI;KAMIGAKI, YOSHIAKI
分类号 H01L21/8247;H01L27/06;H01L27/105;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L29/788 主分类号 H01L21/8247
代理机构 代理人
主权项
地址