Herstellung von schrägen Galvanikstrukturen

摘要

The technical field of the invention is the production of three-dimensional shapable galvanic structures that can be formed on substrates which still owe their possibilities and limitations in the prior art to structuring through photosensitive resist and subsequent galvanic deposition. The invention aims to abandon the use of resist structures resulting from incident light as a pattern for galvanic structures and to make it possible to create galvanic structures which can be freely formed with edge surfaces that need no longer necessarily run vertically or nearly vertically. The invention proposes a production process for metal structures (20, 20a, 20b) that can be formed three-dimensionally (x, y, h) for micromechanics (40), in which at least a conductive layer (plating base; 11, 21, 23) is applied to the substrate; one of the conductive layers (11, 21, 23) is laterally (x, y) structured, a plurality of laterally spaced isolated island areas (12i, 22i, i = 1... n) being thus formed; one of the island areas as a core area (11k, 23k) is cathodically (-) switched during galvanization and the other island areas are not electrically connected (n.c.).