Plasma processing equipment

摘要

A plasma processing equipment executes film formation and etching with a plasma gas. The equipment comprises a gas discharging device (47) serving as a first electrode, a table (35) being provided with loading portions on which substrates (55a) to (55d) to be processed are loaded and rotating in the state of facing said gas discharging device (47), and a single conductive plate (102) provided under said loading portions and serving as a second electrode in common to said substrates (55a) to (55d) loaded on said loading portions. <IMAGE>